Semilab has participated in 16th International Conference on Atomic Layer Deposition between 24.07.2016 and 27.07.2016
Semilab has participated in The 8th International Conference On Technological Advances Of Thin Films and Surface Coatings between 12.07.2016 and 15.07.2016
Semilab has participated in THE 23rd INTERNATIONAL WORKSHOP ON ACTIVE-MATRIX FLATPANEL DISPLAYS AND DEVICES — TFT Technologies and FPD Materials — between 06.07.2016 and 08.07.2016
Semilab has participated in Intersolar Europe 2016 between 22.06.2016 and 24.06.2016
Semilab has participated in Display Taiwan 2016 between 15.06.2016 and 17.06.2016

The Institute of Technical Physics and Materials Science of the Hungarian Academy of Sciences, Epistar Corporation and Semilab published a joint research paper in a recent issue of Applied Surface Science. In the reported work, highly conductive and uniform Ga doped ZnO (GZO) films were prepared by atomic layer deposition (ALD) as transparent conductive layers for InGaN/GaN LEDs. After optimizing the Ga doping concentration, the TCO layer's lateral homogeneity was measured by spectroscopic ellipsometry and Eddy current mapping.

Semilab has participated in 7th International Conference on Spectroscopic Ellipsometry between 06.06.2016 and 10.06.2016
Semilab has participated in Display Week 2016 between 22.05.2016 and 27.05.2016
Semilab has participated in Photovoltaic Technical Conference 2016 between 09.05.2016 and 11.05.2016

Oral presentation at PVTC 2016 conference (Photovoltaic Technical Conference) – May 9-11 Marseille, France

Presentation date / time: May 11, 14:40

Title / authors:

Inline PL Imaging Techniques for Crystalline Silicon Cell Production

F. Korsós, Z. Kiss, Ch. Defranoux and S. Gaillard, Semilab Co. Ltd. (Hungary)