JPV
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The combination of the ion implant process and the process to anneal implants is usually monitored by measuring the sheet resistance of the implanted layer. The sheet resistance varies with dose, energy, and the amount of implanted species that has become electrically active, and it is the sheet resistance that ultimate determines the device performance. Thus, measuring sheet resistance is an excellent way to monitor everything associated with an implant process.
Junction PhotoVoltage (JPV): The basic idea of the method is light excitation of the np or pn layer structure and pick up of the resulting junction photovoltage by a capacitive probe. The detected potential is determined by the sheet resistance of the material
Semilab offers JPV technology, to make non-contact, high resolution, fast maps of sheet resistance.
