PMR-3000

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Ion Implant Monitoring Tool

Based on significant improvements, the Semilab PMR-3000 enables in-line monitoring of implant/anneal processes on product wafers for immediate, accurate, and low-cost production control of implant and RTP systems and in-line monitoring for pre and post anneal implant.

Value Proposition

  • Non-contact optical method measures directly on product wafers
  • Low cost, lower cycle time, represents true product results
  • Quickly locates source of implant/anneal module problems by providing both implant dose and RTP control measurements
  • Highest throughput in market for production monitoring applications
  • New advanced optics designed for high stability, MTBF and MTTR

Hardware Technology:

  • High-reliability, solid state pump and probe lasers (830 nm red pump- 980 nm IR probe)
  • 2-3um diameter measurement spot
  • Cognex pattern recognition system
  • Dual foup 200 and 300 mm bridge platform
Applications: 

Ion Implant Monitoring
Additional remarks: 

Development supported by the National Office for Research and Technology under the project ICMET_07.