GES5E
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The most accurate instrument for Thin Films characterization
The GES5E is the SEMILAB SOPRA core instrument for R&D applications.
GES5E integrates advanced and well proven opto-mechanical designs coupled to high performance electronics, Spectrometers and spectrographs and user friendly Windows software. GES5E is the most recent model of 5 generations of spectroscopic ellipsometers developed by SEMILAB SOPRA.
With over than 20 years of experience in Spectroscopic Ellipsometry technology, SEMILAB SOPRA is widely recognized today as a prime player in this market today.
As a consequence SEMILAB SOPRA Spectroscopic Ellipsometers are currently used as the ReferenceTM tools for Thin Film measurements in both R&D and the Industry.
The unique advantage of the GES5E Platform is that High Resolution measurement mode and Fast measurement mode can coexist on the same platform. This allows material development qualification but also process development control by Fast routine mapping measurements.
GES5E Optical Platform allows various measurement mode from Standard Ellipsometry to generalized Ellipsometry going through photometric measurements (in Transmission and Reflection), Scatterometry, luminescence measurements. All measurements are made automatically as a function of: wavelength, angle of incidence, polarization state and time. Standard spectral range is 230-900nm, and can be extended in both DUV and NIR regions by selecting the adequate options (please refer to SE Options).
Material advanced characterization can also be run on the GES5E by coupling environmental chamber, heating plate, liquid cells and Cryostats. The last development in that field is the EPA (Ellipsometric Porosimeter Atmospheric) option allowing porosity measurement of thin films.
Semilab Sopra produces a Spectroscopic Ellipsometer capable to work down to 135 nm (GES5E with PUV option). The entire spectral range is 135–650 nm. This enable to measure all the new materials designed for the next generation lithography (157 nm, Fe excimer laser), like photoresist, ARC layers and all the optics included in the next generation Stepper.
GES5E with PUV option works into a purged glove box to reduce the oxygen and water contamination in the part per million ranges. Dry Nitrogen is injected continuously in the box with automatic adjustment of the surpressure. One working face with three gloves allows mounting the sample (up to 200 mm diameter) on the sample holder. The optical set up includes a premonochromator in the polarizer arm to avoid photo resist bleaching.
GES5E and its numerous options allows to cover the most advanced the R&D applications in material science today.
GES5E is widely used in Research Laboratories and Universities working in the following fields: Semiconductors, Optics, Optical Telecommunications, Flat Panel Displays, Data Storage, Thin Metals, Chemistry, Biology, organic applications etc…
