Semilab collaborates with IMEC to develop metrology tools for micro- and nanoelectronic applications
Printer-friendly versionSemilab signed a frame agreement with IMEC, the world’s leading independent research institute in the field of micro- and nanoelectronics. This is to facilitate joint development projects (JDPs) related to semiconductor metrology.
The first JPD is expected to start soon, with the topic of characterizing advanced high-k dielectrics using Semilab’s Junction Photovoltage and Charge-Voltage metrologies. The collaboration between the parties already resulted in a patent application regarding the measurement of the mobility of charge carriers in the inversion channel. This development would enable the industry to monitor this important parameter before the finalization of the device.
IMEC and Semilab have signed a general multi-year and potentially multi-project frame agreement to facilitate the rapid implementation of future joint development projects. It is anticipated that the first of several new joint development projects (JDPs) will commence in the next month. The first JDP will target advanced characterization of high-K dielectrics and will be based around Semilab’s WT2000 automation platform installed with Semilab’s Junction Photovoltage and Charge-Voltage measurement technology. The development work will be executed by IMEC and Semilab staff resident in IMEC’s 300mm pilot line facility in Leuven.
“Last Year, Semilab in collaboration with IMEC staff completed an evaluation project which led to the filing of a jointly owned patent for a new application of Semilab’s Junction Photovoltage Measurement technology. Thanks to the expertise of the technical team at IMEC, Semilab is very confident that this frame agreement will result in further innovations from new JDPs in the near future”, said Dr. Tibor Pavelka, President and CEO of Semilab.