Etched Structures

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The Semilab AMS IR family of products uses proprietary model-based infrared reflectometry to measure thickness, depth and parameters of etched and recess filled trench structures with nanometer precision. Our most advanced and flexible MBIR metrology tool is the IR3100. This product uses our latest MBIR technology to deliver high-throughput, non-contact, non-destructive measurements of dielectric layers and etch structures including straight and bottle trench. The IR3100 is capable of incredible speed and accuracy at the 65 nm node and lower for maximum scalability and the lowest cost of ownership in its class.

Products: 

IR-3100

Technologies: 

Model-based infrared technology